1.

Conference Proceedings
Conference Proceedings
1. STABILITY OF PB1-xEuxTe ALLOYS
Salamanca-Young, L. ; Wuttig,M. ; Nahm, S. ; Partin, D.L. ; Hermans, J.
Pub. info.: Characterization of the structure and chemistry of defects in materials : symposium held November 28-December 3, 1988, Boston, Massachusetts, U.S.A..  pp.249-254,  1989.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 138
2.

Conference Proceedings
Conference Proceedings
2. Modeling Water-Protein Interactions in a Protein Crystal
Hermans, J. ; Vacatello, M.
Pub. info.: Water in polymers : based on a symposium cosponsored by the ACS Macromolecular Secretariat and the Division of Biological Chemistry at the 178th meeting of the American Chemical Society, Washington, D.C., September 10-13, 1979.  pp.199-,  1980.  Washington, D.C..  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 127
3.

Conference Proceedings
Conference Proceedings
3. Status 157-nm lithography development at IMEC
Ronse, K.G. ; Bisschop, P.D. ; Eliat, A. ; Goethals, A.M. ; Hermans, J. ; Jonckheere, R. ; Heuvel, D.V.D. ; Roey, F.V. ; Beckx, S. ; Wouters, J.M. ; Marneffe, J.F. ; O'Neil, T. ; Tirri, B. ; Sewell, H.
Pub. info.: Optical Microlithography XVI.  Part One  pp.640-649,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
4.

Conference Proceedings
Conference Proceedings
4. Contamination monitoring and control on ASML MS-VII 157-nm exposure tool
Okoroanyanwu, U. ; Gronheid, R. ; Coenen, J. ; Hermans, J. ; Ronse, K.G.
Pub. info.: Optical Microlithography XVII.  pp.1695-1707,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
5.

Conference Proceedings
Conference Proceedings
5. Optical path and image performance monitoring of a full-field 157-nm scanner
Wells, G. ; Hermans, J. ; Watso, R. ; Kang, Y.-S. ; Morton, R. ; Kocsis, M.K. ; Okoroanyanwu, U. ; De Bisschop, P. ; Stepanenko, N. ; Ronse, K.G.
Pub. info.: Optical Microlithography XVII.  pp.91-98,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377