1.

Conference Proceedings
Conference Proceedings
1. Second level exposure for phase shift mask applications using an SLM-based DUV mask writer [5853-134]
Chandramouli, M. ; Olshausen, B. ; Korobko, Y. ; Henrichs, S. ; Qu, P. ; Ma, J. ; Auches, B. ; Cole, D. ; Ostrom, T. ; Beyerl, A. ; Eklund, R. ; Zerne, R. ; Goransson, P. ; Persson, M. ; Newman, T.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.398-407,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
2.

Conference Proceedings
Conference Proceedings
2. Alt-phase shift mask technology for 65nm logic applications [6154-22]
Chakravorty, K. K. ; Henrichs, S. ; Qiu, W. ; Chavez, J. L. ; Liu, Y.-P. ; Ghadiali, F. ; Yung, K. ; Wilcox, N. ; Silva, M. ; Ma, J. ; Wu, P. ; Irvine, B. ; Yun, H. ; Cheng, W H ; Farnsworth, J
Pub. info.: Optical Microlithography XIX.  pp.61540M-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
3.

Conference Proceedings
Conference Proceedings
3. Optical DC overlay measurement in the 2nd level process of 65 nm alternating phase-shift mask [5992-62]
Ma, J. ; Han, K. ; Lee, K. ; Korobko, Y. ; Silva, M. ; Chavez, J. ; Irvine, B. ; Henrichs, S. ; Chakravorty, K. ; Olshausen, R. ; Chandramouli, M. ; Mammen, B. ; Padmanaban, R.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59921P-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
4.

Conference Proceedings
Conference Proceedings
4. CD-etch depth measurement from advanced phase-shift masks and wafers using optical scatterometry [6152-63]
Lee, K. M. ; Yedur, S. ; Henrichs, S. ; Tavassoli, M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61521P-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152