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23 results

Conference Proceedings

1. Polysulfone-novolac resist for electron beam lithography: I. Fundamental studies of resist properties

Agrawal, A. ; Henderson, C.L.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part Two pp.1138-1149, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

2. Monitoring the dissolution rate of photoresist thin films via multiwavelength interferometry

Agrawal, A. ; Henderson, C.L.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVII. 2 pp.1026-1037, 2003. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5038

Conference Proceedings

3. Polysulfone-novolac resist for electron-beam lithography: II. Effects of resist formulation and processing

Agrawal, A. ; Henderson, C.L.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.453-464, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

4. Synthesis and characterization of photodefinable polycarbonates for use as sacrificial materials in the fabrication of microfluidic devices

White, C.E. ; Henderson, C.L.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.242-253, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

5. Novel surface imaging method using surface monolayer initiated polymerization

McCoy, K. ; Gumieny, C. ; Hess, D.W. ; Tolbert, L.M. ; Henderson, C.L.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part Two pp.1025-1033, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

6. Direct photopatterning of metal oxide materials using photosensitive organometallic precursor films

Barstow, S.J. ; Jeyakumar, A. ; Henderson, C.L.

Pub. info.:	Emerging Lithographic Technologies VI. Part One pp.421-430, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4688

Conference Proceedings

7. Enhancing the electron beam sensitivity of hydrogen silsesquioxane (HSQ)

Jeyakumar, A. ; Henderson, C.L.

Pub. info.:	Advances in Resist Technology and Processing XXI. pp.490-501, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376

Conference Proceedings

8. Effect of photoacid generator additives on the dissolution behavior of bis-trifluoromethyl carbinol substituted polynorbornene

Hoskins, T. ; Berger, C.M. ; Ludovice, P.J. ; Henderson, C.L. ; Seger, L.D. ; Chang, C. ; Rhodes, L.F.

Pub. info.:	Advances in Resist Technology and Processing XXI. pp.1053-1063, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376

Conference Proceedings

9. Chemically amplified photoresist characterization using interdigitated electrodes: an improved method for determining the Dill C parameter

Berger, C.M. ; Henderson, C.L.

Pub. info.:	Advances in Resist Technology and Processing XXI. pp.995-1006, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376

10.

Conference Proceedings

10. Effect of film thickness on the dissolution rate behavior of photoresist polymer thin films

Singh, L. ; Ludovice, P.J. ; Henderson, C.L.

Pub. info.:	Advances in Resist Technology and Processing XXI. pp.1007-1016, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376

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