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32 results

Conference Proceedings

1. Correlation between power density fluctuation and grain size distribution of laser-annealed polycrystalline silicon

Suzuki,K. ; Saitou,M. ; Takahashi,M. ; Hayashi,N. ; Terabayashi,T.

Pub. info.:	Laser applications in microelectronic and optoelectronic manufacturing IV : 25-27 January 1999, San Jose, California. pp.310-319, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3618

Conference Proceedings

2. Development of focused-ion-beam repair for quartz defects on alternating phase-shift masks

Matsumoto,M. ; Abe,T. ; Yokoyama,T. ; Miyashita,H. ; Hayashi,N. ; Sano,H.

Pub. info.:	Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan. pp.308-321, 1997. Bellingham, Washington. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3096

Conference Proceedings

3. Energy level alignment and band bending at organic interfaces

Seki,K. ; Oji,H. ; Ito,E. ; Hayashi,N. ; Ouchi,Y. ; Ishii,H.

Pub. info.:	Organic light-emitting materials and devices III : 19-21 July 1999, Denver, Colorado. pp.178-188, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3797

Conference Proceedings

4. Realization of practical attenuated phase-shift mask with high-transmission KrF excimer laser exposure

Toyama,N. ; Miyashita,H. ; Morikawa,Y. ; Fujita,H. ; Iwase,K. ; Mohri,H. ; Hayashi,N. ; Sano,H.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.350-358, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

5. PMJ '99 panel discussion review:OPC mask technology for KrF Lithography

Kawahira,H. ; Hayashi,N. ; Hamada,H.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.318-327, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

6. N2 laser stereo-lithography

Satoh,S. ; Tanaka,T. ; Hayashi,N. ; Yamabe,C.

Pub. info.:	First International Symposium on Laser Precision Microfabrication : 14-16 June 2000, Omiya, Saitama, Japan. pp.183-186, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4088

Conference Proceedings

7. The Characterization of SiC Hot-Implanted with Ga+

Tanaka,Y. ; Kobayashi,N. ; Hasegawa,M. ; Yoshida,S. ; Ishida,Y. ; Nishijima,T. ; Hayashi,N.

Pub. info.:	Silicon carbide, III-nitrides and related materials, ICSCIII-N'97 : proceedings of the International Conference on Silicon Carbide, III-Nitrides and Related Materials, Stockholm, Sweden, September 1997. Part2 pp.713-716, 1998. Zuerich, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	264-268

Conference Proceedings

8. Study on the Irradiation Induced Defects in 6H-SiC

Hayashi,N. ; Watanabe,H. ; Sakai,K. ; Kuriyama,K. ; Ikeda,Y. ; Maekawa,H. ; Miura,T.

Pub. info.:	Proceedings of the 18th International Conference on Defects in Semiconductors : ICDS-18, Sendai, Japan, July 23-28, 1995. pp.1243-1248, 1995. Zurich, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	196-201

Conference Proceedings

9. Polyurethane resins as resist materials for excimer ablation lithography(EAL)

Hayashi,N. ; Suzuki,K. ; Matsuda,M. ; Ogino,T. ; Tomita,Y.

Pub. info.:	Excimer lasers, optics, and applications : 12-13 February 1997, San Jose, California. pp.129-134, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2992

10.

Conference Proceedings

10. Excimer ablation lithography(EAL)for TFT-LCD

Suzuki,K. ; Matsuda,M. ; Ogino,T. ; Hayashi,N. ; Terabayashi,T. ; Amemiya,K.

Pub. info.:	Excimer lasers, optics, and applications : 12-13 February 1997, San Jose, California. pp.98-107, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2992

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