1.

Conference Proceedings
Conference Proceedings
1. 34 Rapid thermal annealing of atomic layer deposited hafnium-silicate/poly-silicon layers
Rittersma, Z.M. ; Massoubre, D. ; Roozeboorn, F. ; Verheijen, M.A. ; van Berkum, J.G.M ; Tamminga, Y. ; Dao, F. ; Snijders, J.H.M ; Vainonen-Ahigren, E. ; Fois, F. ; Tuominen, M. ; Haukka, S.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.273-280,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-14
2.

Conference Proceedings
Conference Proceedings
2. High-k Oxides by Atomic Layer Chemical Vapour Deposition
Tuominen, M. ; Kanniainen, T. ; Haukka, S.
Pub. info.: Rapid thermal and other short-time processing technologies : proceedings of the international symposium.  pp.271-282,  2000.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-9
3.

Conference Proceedings
Conference Proceedings
3. * Ultra Thin High-K Dielectrics Grown by Atomic Layer Deposition: A Comparative Study of ZrO2, HfO2, Y2O3 and Al2O3
Gusev, E.P. ; Canter, E. ; Copel, M. ; Gribelyuk, M. ; Buchanan, D.A. ; Okorn-Schmidt, H. ; D'Emic, C. ; Kozlowski, P. ; Tuominen, M. ; Linnermo, M. ; Haukka, S.
Pub. info.: Rapid thermal and other short-time processing technologies II : proceedings of the international symposium.  pp.189-196,  2001.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2001-9
4.

Conference Proceedings
Conference Proceedings
4. Study of layer-by-layer growth of silica on alumina and alumina on silica using IR spectroscopy of adsorbed CO
Tsyganenko, A. A. ; Manoilova, O. V. ; Bulanin, K. M. ; Storozhev, P. Yu. ; Haukka, S. ; Palukka, A. ; Lindblad, M.
Pub. info.: 12th International Congress on Catalysis : proceedings of the 12th ICC, Granada, Spain, July 9-14, 2000.  pp.3149-,  2000.  Amsterdam.  Elsevier
Title of ser.: Studies in surface science and catalysis
Ser. no.: 130
5.

Conference Proceedings
Conference Proceedings
5. Adsorption controlled preparation of heterogeneous catalysts
Haukka, S. ; Lakomaa, E. -L. ; Suntola, T.
Pub. info.: Applications in industry.  pp.715-,  1999.  Amsterdam.  Elsevier
Title of ser.: Studies in surface science and catalysis
Ser. no.: 120A
6.

Conference Proceedings
Conference Proceedings
6. The utilization of saturated gas-solid reactions in the preparation of heterogeneous catalysts
Haukka, S. ; Kytokivi, A ; Lakomaa, E. -L. ; Lehtovirta, U. ; Lindblad, M. ; Lujala, V. ; Suntola, T.
Pub. info.: Preparation of catalysts VI : scientific bases for the preparation of heterogeneous catalysts : proceedings of the Sixth International Symposium, Louvain-la-Neuve, September 5-8, 1994.  pp.957-,  1995.  Amsterdam.  Elsevier
Title of ser.: Studies in surface science and catalysis
Ser. no.: 91
7.

Conference Proceedings
Conference Proceedings
7. Analytical Characterization of Process Parameter Influence on the Initial Growth and Crystallinity of Atomic Layer Deposition HfO2 Thin Films
Blin, D. ; Rochat, N. ; Rolland, G. ; Holliger, P. ; Martin, F. ; Damlencourt, J.-F. ; Lardin, T. ; Besson, P. ; Haukka, S. ; Semeria, M.-N.
Pub. info.: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.233-242,  2003.  Pennington, NJ.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5133
8.

Conference Proceedings
Conference Proceedings
8. 57 High-k Dielectric Growth on Germanium by Atomic Layer Deposition
Rahtu, A. ; Ralli, K. ; Putkonen, M. ; Tuominen, M. ; Haukka, S.
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.476-484,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
9.

Conference Proceedings
Conference Proceedings
9. Analytical Characterization of Process Parameter Influence on the Initial Growth and Crystallinity of Atomic Layer Deposition HfO2 Thin Films
Bun, D. ; Rochat, N. ; Rolland, G. ; Holliger, P. ; Martin, F. ; Damlencourt, J.-F. ; Lardin, T. ; Besson, P. ; Haukka, S. ; Semeria, M.-N.
Pub. info.: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.233-242,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-3
10.

Conference Proceedings
Conference Proceedings
10. Atomic Layer CVD For Continuously Shrinking Devices
Haukka, S. ; Elers, K. ; Tuominen, M.
Pub. info.: Materials, technology and reliability for advanced interconnects and low-k dielectrics : symposium held April 23-27, 2000, San Francisco, California, U.S.A..  pp.D6.4-,  2001.  Warrendale, PA.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 612