1.

Conference Proceedings
Conference Proceedings
1. Development of ZrSiO attenuated phase-shift mask for ArF excimer laser lithography
Fukuhara,N. ; Haraguchi,T. ; Kanayama,K. ; Matsuo,T. ; Takeuchi,S. ; Tomiyama,K. ; Saga,T. ; Hattori,Y. ; Ooshima,T. ; Otaki,M.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.979-986,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
2.

Conference Proceedings
Conference Proceedings
2. Proximity effect correction for reticle fabrication
Kamikubo,T. ; Abe,T. ; Oogi,S. ; Anze,H. ; Shimizu,M. ; Itoh,M. ; Nakasugi.T. ; Iijima,T. ; Hattori,Y.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.173-177,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
3.

Conference Proceedings
Conference Proceedings
3. Control of resist heating effect
Anze,H. ; Abe,T. ; Sakurai,H. ; Iijima,T. ; Hattori,Y. ; Nakayamada,N. ; Kamikubo,T.
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.256-265,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997
4.

Conference Proceedings
Conference Proceedings
4. Realization of mass prouction for 130-nm node and future application for high transmission using ZrSi-based attenuated phase-shift mask in ArF lithography
Ii,T. ; Saga,T. ; Hattori,Y. ; Ohshima,T. ; Otaki,M. ; Iwakata,M. ; Haraguchi,T. ; Kanayama,K. ; Yamazaki,T. ; Fukuhara,N. ; Matsuo,T.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.297-308,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
5.

Conference Proceedings
Conference Proceedings
5. ZrSiON as a material for high-transmittance attenuated PSM
Kanayama,K. ; Haraguchi,T. ; Yamazaki,T. ; Ii,T. ; Matsuo,T. ; Fukuhara,N. ; Saga,T. ; Hattori,Y. ; Ooshima,T. ; Otaki,M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.147-154,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
6.

Conference Proceedings
Conference Proceedings
6. Actual use of phase-shift mask
Yamada,Y. ; Unno,H. ; Chiba,K. ; Karikawa,E. ; Kikuchi,Y. ; Hattori,Y. ; Kinemura,K.
Pub. info.: 15th Annual BACUS Symposium on Photomask Technology and Management.  pp.266-272,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2621