1.

Conference Proceedings
Conference Proceedings
1. ESTIMATING LOCAL DEPOSITION CONDITIONS AND KINETIC PARAMETERS USING FILM PROFILE
Cale, T. S. ; Chara, M. B. ; Hasper, A.
Pub. info.: Advanced metallization and processing for semiconductor devices and circuits--II : symposium held April 27-May 1, 1992, San Francisco, California, U.S.A..  pp.393-398,  1992.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 260
2.

Conference Proceedings
Conference Proceedings
2. 29 Batch Atomic Layer Deposition for MIM capacitors
de Blank, R. ; Snijders, G.J. ; Beulens, S. ; Vandezande, L. ; Wilhelm, R. ; Hasper, A.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.225-230,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-14
3.

Conference Proceedings
Conference Proceedings
3. Comparison of the Performance of Single Wafer and Batch Systems for Identical Processes
Claasen, T. ; Driel, R. Van ; Hasper, A. ; Radelaar, S.
Pub. info.: Rapid thermal and integrated processing VII : symposium held April 13-15, 1998, San Francisco, California, U.S.A..  pp.3-,  1998.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 525
4.

Conference Proceedings
Conference Proceedings
4. The Process of Innovation in Batch Fumaces
Hasper, A. ; Claasen-Vujcic, T. ; Noben, R.
Pub. info.: Rapid thermal and other short-time processing technologies III : proceedings of the international symposium.  pp.11-20,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-11
5.

Conference Proceedings
Conference Proceedings
5. Uniformity of Deposition in the High Temperature LPCVD of SiO2 From Dichiorosilane and Nitrous Oxide
Mattiussi, G. ; Brydges, S. ; Hasper, A.
Pub. info.: Proceedings of the Thirteenth International Symposium on Chemical Vapor Deposition.  pp.431-439,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-5