Overlay performance with advanced ATHENA alignment strategies
- Author(s):
Huijbregste, J. ( ASML (Netherlands) ) Haren, R.J.F. ( ASML (Netherlands) ) Jeunink, A. ( ASML (Netherlands) ) Hinnen, P.C. ( ASML (Netherlands) ) Swinnen, B. ( ASML (Netherlands) ) Navarro, R. ( ASML (Netherlands) ) Simons, G. ( ASML (Netherlands) ) Bilsen, F. ( ASML (Netherlands) ) Tolsma, H. ( ASML (Netherlands) ) Megens, H.J.L. ( ASML (Netherlands) ) - Publication title:
- Metrology, Inspection, and Process Control for Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5038
- Pub. Year:
- 2003
- Vol.:
- 2
- Page(from):
- 918
- Page(to):
- 928
- Pages:
- 11
- Pub. info.:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448439 [0819448435]
- Language:
- English
- Call no.:
- P63600/5038
- Type:
- Conference Proceedings
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