1.

Conference Proceedings
Conference Proceedings
1. Development of ZrSiO attenuated phase-shift mask for ArF excimer laser lithography
Fukuhara,N. ; Haraguchi,T. ; Kanayama,K. ; Matsuo,T. ; Takeuchi,S. ; Tomiyama,K. ; Saga,T. ; Hattori,Y. ; Ooshima,T. ; Otaki,M.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.979-986,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
2.

Conference Proceedings
Conference Proceedings
2. Zr-based films for attenuated phase-shift mask
Matsuo,T. ; Ohkubo,K. ; Haraguchi,T. ; Ueyama,K.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.354-361,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
3.

Conference Proceedings
Conference Proceedings
3. ZrSiO:a new and robust material for attenuated phase-shift mask in ArF Lithography
Onodera,T. ; Matsuo,T. ; Nakazawa,K. ; Miyazaki,J. ; Ogawa,T. ; Morimoto,H. ; Haraguchi,T. ; Fukuhara,N. ; Otaki,M. ; Takeuchi,S.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.337-343,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
4.

Conference Proceedings
Conference Proceedings
4. Materials for an attenuated phase-shifting mask in 157-nm lithography
Matsuo,T. ; Onodera,T. ; Itani,T. ; Morimoto,H. ; Haraguchi,T. ; Kanayama,K. ; Otaki,M.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.268-274,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
5.

Conference Proceedings
Conference Proceedings
5. Realization of mass prouction for 130-nm node and future application for high transmission using ZrSi-based attenuated phase-shift mask in ArF lithography
Ii,T. ; Saga,T. ; Hattori,Y. ; Ohshima,T. ; Otaki,M. ; Iwakata,M. ; Haraguchi,T. ; Kanayama,K. ; Yamazaki,T. ; Fukuhara,N. ; Matsuo,T.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.297-308,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
6.

Conference Proceedings
Conference Proceedings
6. ZrSiON as a material for high-transmittance attenuated PSM
Kanayama,K. ; Haraguchi,T. ; Yamazaki,T. ; Ii,T. ; Matsuo,T. ; Fukuhara,N. ; Saga,T. ; Hattori,Y. ; Ooshima,T. ; Otaki,M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.147-154,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
7.

Conference Proceedings
Conference Proceedings
7. Optimization of Zr-Si compound films for attenuated PSM
Haraguchi,T. ; Matsuo,T. ; Takeuchi,S.
Pub. info.: Photomask and X-Ray Mask Technology V.  pp.609-612,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3412