1.

Conference Proceedings
Conference Proceedings
1. Solutions for printing sub-100-nm contacts with ArF
Graeupner, P. ; Goehnermeier, A. ; Lowisch, M. ; Garreis, R.B. ; Flagello,D.G. ; Hansen, S.G. ; Socha, R.J. ; Koehler, C.
Pub. info.: Optical Microlithography XV.  Part One  pp.503-514,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
2.

Conference Proceedings
Conference Proceedings
2. Performance of a high-NA dual-stage 193-nm TWINSCAN Step and Scan system for 80-nm applications
Klerk, J. ; Jorritsma, L. ; Setten, E. ; Droste, R. ; Jongh, R.C. ; Hansen, S.G. ; Smith, D. ; Kerkhof, M.A. ; Mast, F. ; Graeupner, P. ; Rohe, T. ; Kornitzer, K.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.822-840,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
3.

Conference Proceedings
Conference Proceedings
3. Progress in 157-nm resist performance and potential
Wong, P. ; Sinkwitz, S. ; Hansen, S.G. ; Goethals, A.-M. ; Conley, W.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.512-521,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
4.

Conference Proceedings
Conference Proceedings
4. New methods to calibrate simulation parameters for chemically amplified resists
Tollkuehn, B. ; Erdmann, A. ; Kivel, N. ; Robertson, S.A. ; Kang, D. ; Hansen, S.G. ; Fumar-Pici, A. ; Chiou, T.-B. ; Hoppe, W.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1168-1179,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
5.

Conference Proceedings
Conference Proceedings
5. Resist vector: connecting the aerial image to reality
Hansen, S.G.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.366-380,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
6.

Conference Proceedings
Conference Proceedings
6. Impact on OPC treatment accuracy due to illumination pupil shape deviation for 110-nm target CD
Roy, S. ; Schlief, R.E. ; Hsu, S. ; Shi, X. ; Liebchen, A. ; Chen, J.F. ; Hansen, S.G.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part Two  pp.876-883,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
7.

Conference Proceedings
Conference Proceedings
7. Calibration of EUV 2D photoresist simulation parameters for accurate predictive modeling
Robertson, S.A. ; Naulleau, P.P. ; O'Connell, D.J. ; McDonald, K. ; Delano, T.M. ; Goldberg, K.A. ; Hansen, S.G. ; Brown, K.W. ; Brainard, R.L.
Pub. info.: Emerging Lithographic Technologies VII.  2  pp.900-909,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
8.

Conference Proceedings
Conference Proceedings
8. Calibration of ESCAP resist simulation parameters from consideration of printed CD pitch bias, CD measurement offset, and wafer thermal history
Robertson, S.A. ; Kang, D. ; Tye, S.D. ; Hansen, S.G. ; Fumar-Pici, A. ; Chiou, T.-B. ; Byers, J.D. ; Mack, C.A. ; Smith, M.D.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part Two  pp.952-962,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690