1.
Conference Proceedings
Yoshino,Y. ; Morishige,Y. ; Watanabe,S. ; Kyusho,Y. ; Ueda,A. ; Haneda,T. ; Oomiya,M.
Pub. info.:
20th Annual BACUS Symposium on Photomask Technology . pp.663-669, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4186
2.
Conference Proceedings
Ueda,A. ; Yoshino,Y. ; Morishige,Y. ; Watanabe,S. ; Kyusho,Y. ; Haneda,T. ; Ohmiya,M.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology VIII . pp.574-582, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4409
3.
Conference Proceedings
Haneda,T. ; Shimanaka,T. ; Wakabayashi,K. ; Yoshino,Y.
Pub. info.:
Photomask and X-Ray Mask Technology III . pp.473-480, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2793