Search records | 東京工業大学附属図書館文献データベース

You can search for articles included in proceedings of international conferences and technical papers which Tokyo Tech Library holds.
Tokyo Tech members can obtain tables of contents of 17,000 foreign journals by SwetScan. Tokyo Tech Library does not cover all of them.
List of Searchable Databases

Clear Form

Search for other sites by same keyword(s).

CiNii Books

NDL Search

WebcatPlus

amazon

カーリル

WorldCat

Filter

Title:

Author:

ISBN / ISSN / Paper No:

Source Title:

Publisher:

Publication Year:

～

Clear Form

Type:

Conference Proceedings

Technical Paper

Academic Journal

Select: Check all | Remove all

Sort order

10 | 50 | 100 / Per Page

23 results

Conference Proceedings

1. The study to enhance the accuracy of FIB repair on mask pattern of DRAM [6152-94]

Choi, Y. ; Kim, H. ; Kim, S. ; Han, O.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XX. pp.61522H-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6152

Conference Proceedings

2. Novel cleaning techniques to achieve defect-free photomasks for sub-65-nm nodes [6349-109]

Ryu, J. H. ; Lee, D. W. ; Ryu, J. S. ; Kim, S. P. ; Han, O.

Pub. info.:	Photomask Technology 2006. pp.63492V-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

Conference Proceedings

3. The surface treatment for prevention of growing defect [5992-52]

Jun, J. -Y. ; Ryu, J. -S. ; Choi, Y. -Y. ; Han, O.

Pub. info.:	25th Annual BACUS Symposium on Photomask Technology. pp.59921F-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5992

Conference Proceedings

4. Image enhancement technology to get fine defect image for FIB [5992-49]

Choi, Y. ; Kim, H. ; Han, O.

Pub. info.:	25th Annual BACUS Symposium on Photomask Technology. pp.59912C-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5992

Conference Proceedings

5. Self-aligned resist patterning by backside flood exposure in photomask [6349-168]

Ha, T. ; Gyun, B. ; Han, O.

Pub. info.:	Photomask Technology 2006. pp.63494D-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

Conference Proceedings

6. Multi-point CD measurement method to evaluate pattern fidelity and performance of mask [6349-155]

Kim, M. ; Lee, H. ; Seo, K. ; Lee, D. ; Choi, Y. ; Oh, S. ; Han, O.

Pub. info.:	Photomask Technology 2006. pp.634944-634945, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

Conference Proceedings

7. Enhancement of CD uniformity and throughput with KrF photomask repeater

Ha, T.-J. ; Choi, Y.-K. ; Han, O.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.809-818, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

8. Printability evaluation for 800-nm contact hole with repaired patterns according to exposing condition

Kim, S. P. ; Kim, S. C. ; Kim, H. C. ; Lee, S. I. ; Choi, Y. K. ; Han, O.

Pub. info.:	24th Annual BACUS Symposium on Photomask Technology. pp.1091-1098, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5567

Conference Proceedings

9. Enhancement of CD uniformity and throughput with KrF photomask repeater

Ha, T.-J. ; Choi, Y.-K. ; Han, O.

Pub. info.:	Optical Microlithography XVI. Part Two pp.1025-1034, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

10.

Conference Proceedings

10. Survey of SO4 out gas on mask storage environment [5992-143]

Lee, J. S. ; Jee, S. B. ; Hwang, S. M. ; Park, S. Y. ; Han, O.

Pub. info.:	25th Annual BACUS Symposium on Photomask Technology. pp.599248-599248, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5992

23 results

Select: Check all | Remove all

Sort order

10 | 50 | 100 / Per Page

Filtering by:

Author: Han, O.