1.

Conference Proceedings
Conference Proceedings
1. Mask fabrication results using new laser writing system: Sigma7300 [6283-14]
Lee, -J. H. ; Nam, -S. D. ; Lee, -H. S. ; Kim, -S. H. ; Han, -S. H. ; Kim, -G. B. ; Choi, -W. S. ; Han, -S. W.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62831J-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
2.

Conference Proceedings
Conference Proceedings
2. Photomask dry-etching techniques for hard mask [6283-24]
Kwon, -W. S. ; Park, -J. Y. ; Kim, -Y. S. ; Lee, H. ; Kwon, -J. H. ; Choi, -W. H. ; Han, -S. W.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62831T-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
3.

Conference Proceedings
Conference Proceedings
3. The characterization of line-width in mask using spectrophotometry [6283-51]
Bang, -Y. K. ; Choi, -H. Y. ; Yaon, -J. H. ; Jeong, -Y H. ; Kim, -H. Y. ; Choi, -W. S. ; Yaon, -S. H. ; Han, -S. W.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62832H-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
4.

Conference Proceedings
Conference Proceedings
4. Reduction of MDP time through the improvement of verification method [6283-57]
Noh, -H. Y. ; Jang, -H. S. ; Ki, -T. W. ; Choi, -H. J. ; Choi, -W. S. ; Han, -S. W.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62832N-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283