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23 results

Conference Proceedings

1. Current status and future prospects of laser stereolithography(Invited Paper)

Hagiwara, T.

Pub. info.:	Fifth International Symposium on Laser Precision Microfabrication : 11-14 May, 2004, Nara, Japan. pp.644-648, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5662

Conference Proceedings

2. Investigation of polarization effects on new mask materials

Itakura, Y. ; Kawasa, Y. ; Wakabayashi, O. ; Moriya, M. ; Nagai, S. ; Sumitani, A. ; Hagiwara, T. ; Ishimaru, T. ; Tsuji, S. ; Fujii, K. ; Wakamiya, W.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.587-598, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Conference Proceedings

3. Influence of pellicle mounting to predicted mask flatness

Itoh, M. ; Inoue, S. ; Hagiwara, T. ; Kondo, N.

Pub. info.:	EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany. pp.13-19, 2005. Bellingham, Wash.,. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5835

Conference Proceedings

4. Compact high-speed computed radiography (CR) system using a linear CCD with a large-area phtodiode (PD) and dual transfer lines

Arakawa, S. ; Yasuda, H. ; Kuwabara, T. ; Suzuki, H. ; Suzuki, T. ; Hagiwara, T.

Pub. info.:	Medical Imaging 2003 : Physics of Medical Imaging : 16-18 February 2003, San Diego, California, USA. 2 pp.778-787, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5030

Conference Proceedings

5. Development and evaluation of an F2 laser for immersion interference lithography at 157 nm

Itakura, Y. ; Kawasa, Y. ; Wakabayashi, O. ; Moriya, M. ; Nagai, S. ; Sumitani, A. ; Hagiwara, T. ; Ishimaru, T. ; Tsuji, S. ; Fujii, K. ; Wakamiya, W.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.1269-1278, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Conference Proceedings

6. Development of aerial image based aberration measurement technique

Hagiwara, T. ; Kondo, N. ; Hiroshi, I. ; Suzuki, K. ; Magome, N.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.1659-1669, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Conference Proceedings

7. Effect of Excess Vacancy on Antiphase Domain Growth in Fe3Al

Koizumi, Y. ; Hagiwara, T. ; Minamino, Y. ; Tsuji, N.

Pub. info.:	Integrative and interdisciplinary aspects of intermetallics : symposium held November 29-December 1, 2004, Boston, Massachusetts, U.S.A.. pp.53-58, 2005. Warrendale, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	842

Technical Paper

8. Newly Developed Inline 4 AR Series SI Engine.

Tsuchiya, T. ; Hosoi, H. ; Hoshi, K. ; Shimamura, H. ; Hagiwara, T.

Pub. info.:	2009 SAE world congress : technical paper. 2009. Warrendale, Penn.. Society of Automotive Engineers
Title of ser.:	Society of Automotive Engineers technical paper series
Ser. no.:	2009

Conference Proceedings

9. Desirable wafer edge flatness for CD control in photolithography

Fujisawa, T. ; Inoue, S. ; Hagiwara, T. ; Kennichi, K. ; Kobayashi, M. ; Okumura, K.

Pub. info.:	Optical Microlithography XVI. Part One pp.600-609, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

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Conference Proceedings

10. Desirable reticle flatness from focus deviation standpoint in optical lithography

Inoue, S. ; Itoh, M. ; Asano, M. ; Okumura, K. ; Hagiwara, T. ; Moriya, J.

Pub. info.:	Optical Microlithography XV. Part One pp.530-540, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4691

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Author: Hagiwara, T.