1.

Conference Proceedings
Conference Proceedings
1. Alkylimidazolium Fluorohydrogenates Room Temperature Molten Salts
Hagiwara, R. ; Matsumoto, K. ; Nakamori, Y. ; Tsuda, T. ; Ito, Y. ; Matsumoto, H. ; Momota, K.
Pub. info.: Molten Salts XIII : proceedings of the international symposium.  pp.1007-1013,  2002.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-19
2.

Conference Proceedings
Conference Proceedings
2. High-energy X-ray Diffraction Studies of Alkylimidazolium Fluorohydrogenate Room-Temperature Molten Salts at Spring-8 High-Energy X-ray Diffraction Beamline BLO4B2
Kohara, S. ; Hagiwara, R. ; Matsumoto, K ; Ito, Y. ; Kajinami, A. ; Suzuya, K.
Pub. info.: Molten Salts XIII : proceedings of the international symposium.  pp.1047-1056,  2002.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-19
3.

Conference Proceedings
Conference Proceedings
3. Advanced FIB mask repair technology for 100-nm/ArF lithography: II
Hagiwara, R. ; Yasaka, A. ; Aita, K. ; Takaoka, O. ; Koyama, Y. ; Kozakai, T. ; Doi, T. ; Muramatsu, M. ; Suzuki, K. ; Sugiyama, Y. ; Matsuda, O. ; Okabe, M. ; Shinohara, S. ; Hasuda, M. ; Adachi, T. ; Morikawa, Y. ; Nishiguchi, M. ; Sato, Y. ; Hayashi, N. ; Ozawa, T. ; Tanaka, Y. ; Yoshioka, N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.510-519,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
4.

Conference Proceedings
Conference Proceedings
4. Advanced photomask repair technology for 65-nm lithography: II
Itou, Y. ; Tanaka, Y. ; Yoshioka, N. ; Sugiyama, Y. ; Hagiwara, R. ; Takahashi, H. ; Takaoka, O. ; Kozakai, T. ; Matsuda, O. ; Suzuki, K. ; Okabe, M. ; Kikuchi, S. ; Uemoto, A. ; Yasaka, A. ; Adachi, T. ; Nishida, N. ; Ozawa, T.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.1132-1143,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
5.

Conference Proceedings
Conference Proceedings
5. Advanced photomask repair technology for 65 nm lithography (4) [5992-170]
Itou, Y. ; Tanaka, Y. ; Suga, O. ; Sugiyama, Y. ; Hagiwara, R. ; Takahashi, H. ; Takaoka, O. ; Kozakai, T. ; Matsuda, O. ; Suzuki, K. ; Okabe, M. ; Kikuchi, S. ; Uemoto, A. ; Yasaka, A. ; Adachi, T.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59924Y-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
6.

Conference Proceedings
Conference Proceedings
6. Advanced photomask repair technology for 65-nm lithography [6349-50]
Aramaki, F. ; Kozakai, T. ; Muramatsu, M. ; Sugiyama, Y. ; Koyama, Y. ; Matsuda, O. ; Suzuki, K. ; Okabe, M. ; Doi, T. ; Hagiwara, R. ; Adachi, T. ; Yasaka, A. ; Tanaka, Y. ; Suga, O ; Nishida, N.
Pub. info.: Photomask Technology 2006.  pp.63491E-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
7.

Conference Proceedings
Conference Proceedings
7. Advanced FIB mask repair technology for 100-nm/ArF lithography
Hagiwara, R. ; Yasaka, A. ; Aita, K. ; Takaoka, O. ; Koyama, Y. ; Kozakai, T. ; Doi, T. ; Muramatsu, M. ; Suzuki, K. ; Sugiyama, Y. ; Sawaragi, H. ; Okabe, M. ; Shinohara, S. ; Hasuda, M. ; Adachi, T. ; Morikawa, Y. ; Nishiguchi, M. ; Sato, Y. ; Hayashi, N. ; Ozawa, T. ; Tanaka, Y. ; Yoshioka, N.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1056-1064,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
8.

Conference Proceedings
Conference Proceedings
8. Advanced FIB mask repair technology for 90-nm/ArF lithography: III
Tanaka, Y. ; Itou, Y. ; Yoshioka, N. ; Hagiwara, R. ; Yasaka, A. ; Takaoka, O. ; Kozakai, T. ; Koyama, Y. ; Sawaragi, H. ; Sugiyama, Y. ; Muramatsu, M. ; Doi, T. ; Suzuki, K. ; Okabe, M. ; Shinohara, M. ; Matsuda, O. ; Aita, K. ; Adachi, T. ; Morikawa, Y. ; Nishiguchi, M. ; Satoh, Y. ; Hayashi, N.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.526-537,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
9.

Conference Proceedings
Conference Proceedings
9. Advanced photomask repair technology for 65-nm lithography (1)
Itou, Y. ; Tanaka, Y. ; Yoshioka, N. ; Sugiyama, Y. ; Hagiwara, R. ; Takahashi, H. ; Takaoka, O. ; Tashiro, J. ; Suzuki, K. ; Okabe, M. ; Kikuchi, S. ; Uemoto, A. ; Yasaka, A. ; Adachi, T. ; Nishida, N. ; Ozawa, T.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.301-312,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
10.

Conference Proceedings
Conference Proceedings
10. FIB mask repair technology for electron projection lithography
Yamamoto, Y. ; Hasuda, M. ; Suzuki, H. ; Sato, M. ; Takaoka, O. ; Matsumura, H. ; Matsumoto, N. ; Iwasaki, K. ; Hagiwara, R. ; Suzuki, K. ; Ikku, Y. ; Aita, K. ; Kaito, T. ; Adachi, T. ; Yasaka, A. ; Yamamoto, J. ; Iwasaki, T. ; Yamabe, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.348-356,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446