1.

Conference Proceedings
Conference Proceedings
1. Metrology test reticles for advanced optical lithography
H.M. Marchman ; C. Pierrat ; J.E. Griffith ; J.L. Nistler ; A. Williams
Pub. info.: 14th annual Symposium on Photomask Technology and Management : proceedings : 14-16 September 1994, Santa Clara, California.  pp.360-373,  1994.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2322
2.

Conference Proceedings
Conference Proceedings
2. Phase-shift mask metrology using scatterometry
S.M.G. Wilson ; H.M. Marchman ; S.S.H. Naqvi ; J.R. McNeil
Pub. info.: 14th annual Symposium on Photomask Technology and Management : proceedings : 14-16 September 1994, Santa Clara, California.  pp.305-315,  1994.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2322
3.

Conference Proceedings
Conference Proceedings
3. Optimizing 0.25-µm lithography using confocal microscopy
R.E. Colgan ; H.M. Marchman
Pub. info.: 14th annual Symposium on Photomask Technology and Management : proceedings : 14-16 September 1994, Santa Clara, California.  pp.336-343,  1994.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2322
4.

Conference Proceedings
Conference Proceedings
4. Metrology of etched quartz and chrome embedded phase shift gratings using scatterometry
S.M.G. Wilson ; S.S.H. Naqvi ; J.R. McNeil ; H.M. Marchman ; B.D. Johs
Pub. info.: Integrated circuit metrology, inspection, and process control IX : 20-22 February 1995, Santa Clara, California.  pp.479-494,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2439
5.

Conference Proceedings
Conference Proceedings
5. Resist contrast requirement for sub-0.25-µm lithography
J.Z.Y. Guo ; A.E. Novembre ; H.M. Marchman ; J.A. Abate ; J. Frackoviak
Pub. info.: Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California.  pp.86-93,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2437