1.

Conference Proceedings
Conference Proceedings
1. Optimum combination of source, mask, and filter for better lithographic performance
H.-K. Oh ; J.-U. Koo ; Y.-M. Cho ; B.-S. Park ; H.B. Chung
Pub. info.: Optical/laser microlithography VIII : 22-24 February, 1995, Santa Clara, California.  pp.838-849,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2440
2.

Conference Proceedings
Conference Proceedings
2. Baseline error-free non-TTL alignment system using oblique illumination for wafer steppers
D.H. Kim ; K.H. Lee ; Y.H. Oh ; J.H. Lee ; H.B. Chung
Pub. info.: Optical/laser microlithography VIII : 22-24 February, 1995, Santa Clara, California.  pp.928-937,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2440
3.

Conference Proceedings
Conference Proceedings
3. Optical lithography technique with dummy diffraction mask for 0.20 µm T-shaped gate formation
B.-S. Park ; Y.H. Oh ; S.-S. Choi ; H.B. Chung ; H.J. Yoo
Pub. info.: Optical/laser microlithography VIII : 22-24 February, 1995, Santa Clara, California.  pp.850-859,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2440