Depth-of-focus (DOF) and line-width roughness (LWR) performance of novel surface conditioner solutions for immersion lithography
- Author(s):
B. J. Lu ( United Microelectronics Corp. (Taiwan) ) Y. Huang ( United Microelectronics Corp. (Taiwan) ) H. T. Tseng ( United Microelectronics Corp. (Taiwan) ) C. C. Yu ( United Microelectronics Corp. (Taiwan) ) L. Meng ( Air Products and Chemicals, Inc. (USA) ) M. Liao ( Air Products and Chemicals, Inc. (USA) ) M. Legenza ( Air Products and Chemicals, Inc. (USA) ) - Publication title:
- Advances in resist materials and processing technology XXIV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6519
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466389 [0819466387]
- Language:
- English
- Call no.:
- P63600/6519
- Type:
- Conference Proceedings
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