1.

Conference Proceedings
Conference Proceedings
1. The lithography technology for the 32 nm HP and beyond
M. Dusa ; B. Arnold ; J. Finders ; H. Meiling ; K. van Ingen Schenau
Pub. info.: Photomask and next-generation lithography mask technology XV.  1  pp.702810-1-702810-11,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7028
2.

Conference Proceedings
Conference Proceedings
2. EUV lithography with the Alpha Demo Tools: status and challenges
N. Harned ; M. Goethals ; R. Groeneveld ; P. Kuerz ; M. Lowisch ; H. Meijer ; H. Meiling ; K. Ronse ; J. Ryan ; M. Tittnich ; H. Voorma ; J. Zimmerman ; U. Mickan ; S. Lok
Pub. info.: Emerging lithographic technologies XI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6517
3.

Conference Proceedings
Conference Proceedings
3. Performance of the full field EUV systems
H. Meiling ; E. Boon ; N. Buzing ; K. Cummings ; O. Frijns
Pub. info.: Emerging lithographic technologies XII.  1  pp.69210L-1-69210L-13,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6921