1.

Conference Proceedings
Conference Proceedings
1. DAMASCENE METAL GATE FOR 70 nm CMOS PROCESS
Guillaumot, B. ; Ducroquet, F. ; Ernst, T. ; Guegan, G. ; Galon, C. ; Renard, C. ; PrevitaIi, B. ; Rivoire, M. ; Nier, M.E. ; Tedesco, S. ; Fargeot, T. ; Achard, H. ; Deleonibus, S.
Pub. info.: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.793-802,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-2
2.

Conference Proceedings
Conference Proceedings
2. Replacing the BOX with buried alumina: improved thermal dissipation in SOI MOSFETs
Oshima, K. ; Cristoloveanu, S. ; Guillaumot, B. ; Carval, G.be ; Lwai, H. ; Mazure, C. ; Kang, M.S. ; Rae, Y.H. ; Kwon, J.W. ; Deleonibus, S. ; Lee, J.H.
Pub. info.: Silicon-on-insulator technology and devices XI : proceedings of the international symposium.  pp.45-50,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-5
3.

Conference Proceedings
Conference Proceedings
3. Study of Work Function of CVD WSix Thin Film on High-k Dielectric
Maitrejean, S. ; Allegret, S. ; Fillot, F. ; Farjot, T. ; Guillaumot, B. ; Passemard, G.
Pub. info.: Fundamentals of novel oxide/semiconductor interfaces : symposium held December 1-4, 2003, Boston, Massachusetts, U.S.A..  pp.285-290,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 786
4.

Conference Proceedings
Conference Proceedings
4. Study of Metal Gate Work Function Modulation Using Plasma and SiH4 Treated TiN Thin Films
Fillot, F. ; Maitrejean, S. ; Farjot, T. ; Guillaumot, B. ; Chenevier, B. ; Passemard, G.
Pub. info.: Fundamentals of novel oxide/semiconductor interfaces : symposium held December 1-4, 2003, Boston, Massachusetts, U.S.A..  pp.259-266,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 786
5.

Conference Proceedings
Conference Proceedings
5. Atomic Vapor Deposition (AVDTM) process for High Performance HfO2 Dielectric Layers
Cosnier, V. ; Dabertrand, K. ; Blonkowski, S. ; Lhostis, S. ; Zoll, S. ; Morand, Y. ; Descombes, S. ; Guillaumot, B. ; Hobbs, C. ; Rochat, N. ; Rolland, G. ; Renault, O. ; Garros, X. ; Casse, M. ; Mitard, J. ; Lehnen, P. ; Miedl, S. ; Lindner, J. ; Schumacher, M.
Pub. info.: Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.287-292,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 811
6.

Conference Proceedings
Conference Proceedings
6. DAMASCENE METAL GATE FOR 70 nm CMOS PROCESS
Guillaumot, B. ; Ducroquet, F. ; Ernst, T. ; Guegan, G. ; Galon, C. ; Renard, C. ; PrevitaIi, B. ; Rivoire, M. ; Nier, M.E. ; Tedesco, S. ; Fargeot, T. ; Achard, H. ; Deleonibus, S.
Pub. info.: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.793-802,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-2