1.

Conference Proceedings
Conference Proceedings
1. CD metrology for the 45-nm and 32-nm nodes
Rice, B.J. ; Cao, H.B. ; Chaudhuri, O. ; Grumski, M.G. ; Harteneck, B.D. ; Liddle, A. ; Olynick, D. ; Roberts, J.M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.183-190,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
2.

Conference Proceedings
Conference Proceedings
2. Prospects for using primary electron-based CD metrology
Rice, B.J. ; Crays, G.L. ; Danilevsky, A. ; Grumski, M.G. ; Koshihara, S. ; Otaka, T. ; Roberts, J.M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.1247-1253,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375