1.

Conference Proceedings
Conference Proceedings
1. Intrawafer CD control in state-of-the-art lithography
Pollentier,I.K. ; Baerts,C. ; Marschner,T. ; Ronse,K. ; Grozev,G. ; Reybrouck,M.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.882-892,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. Adjustment of bilayer optical properties and the effect on imaging and etching performance
Neisser,M.O. ; Biafore,J.J. ; Foster,P. ; Spaziano,G. ; Sarubbi,T.R. ; Driessche,V.Van ; Grozev,G. ; Tzviatkov,P.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.942-951,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. Low-temperature 193-nm resist reflow process for 100-nm generation contact patterning
Driessche,V.Van ; Lucas,K. ; Roey,F.Van ; Grozev,G. ; Tzviatkov,P.
Pub. info.: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.396-407,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4404