EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany. pp.628106-628106, 2006. Bellingham, Wash.,. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.1591-1600, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Kocsis, M. ; Van Den Heuvel, D. ; Gronheid, R. ; Maenhoudt, M. ; Vangoidsenhoven, D. ; Wells, G. ; Stepanenko, N. ; Benndorf, M. ; Kim, H. W ; Kishimura, S. ; Ercken, M. ; Van Roey, F. ; O’Brien, S. ; Fyen, W. ; Foubert, P ; Moerman, R ; Streefkerk, B.
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Optical Microlithography XIX. pp.615409-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering