1.

Conference Proceedings
Conference Proceedings
1. Iso-sciatic point: novel approach to distinguish shadowing 3D mask effects form scanner aberrations in extreme ultraviolet lithography [6281-08]
Luenissen, A. H. L. ; Gronheid, R. ; Gao, W.
Pub. info.: EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany.  pp.628106-628106,  2006.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6281
2.

Conference Proceedings
Conference Proceedings
2. In-line monitoring of acid and base contaminants at low ppt-levels for 193nm lithography
Gronheid, R. ; Al-Horr, R.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1591-1600,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
3.

Conference Proceedings
Conference Proceedings
3. Immersion specific defect mechanisms: findings and recommendations for their control [6154-180]
Kocsis, M. ; Van Den Heuvel, D. ; Gronheid, R. ; Maenhoudt, M. ; Vangoidsenhoven, D. ; Wells, G. ; Stepanenko, N. ; Benndorf, M. ; Kim, H. W ; Kishimura, S. ; Ercken, M. ; Van Roey, F. ; O’Brien, S. ; Fyen, W. ; Foubert, P ; Moerman, R ; Streefkerk, B.
Pub. info.: Optical Microlithography XIX.  pp.615409-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
4.

Conference Proceedings
Conference Proceedings
4. Dynamic leaching procedure on an immersion interference printer [6154-186]
Gronheid, R. ; Tenaglia, E. ; Ercken, M.
Pub. info.: Optical Microlithography XIX.  pp.61541I-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
5.

Conference Proceedings
Conference Proceedings
5. Early learning on hyper-NA lithography using two-beam immersion interference [6154-70]
Hendrickx, E. ; Op de Beeck, M. ; Gronheid, R. ; Versluijs, J. ; Van Look, L. ; Ercken, M. ; Vandenberghe, G.
Pub. info.: Optical Microlithography XIX.  pp.61541X-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
6.

Conference Proceedings
Conference Proceedings
6. Contamination monitoring and control on ASML MS-VII 157-nm exposure tool
Okoroanyanwu, U. ; Gronheid, R. ; Coenen, J. ; Hermans, J. ; Ronse, K.G.
Pub. info.: Optical Microlithography XVII.  pp.1695-1707,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
7.

Conference Proceedings
Conference Proceedings
7. 157-nm photoresist process optimization for a full-field scanner
Light, S. ; Stepanenko, N. ; Gronheid, R. ; Van Roey, F. ; Van den Heuvel, D. ; Goethals, A.-M.
Pub. info.: Optical Microlithography XVII.  pp.1658-1668,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377