BEOL lithography for early development at the 65-nm node
- Author(s):
DellaGuardia, R. ( IBM Microelectronics Div. (USA) ) Kwong, R.W. ( IBM Microelectronics Div. (USA) ) Li, W. ( IBM Microelectronics Div. (USA) ) Lawson, P. ( IBM Microelectronics Div. (USA) ) Burkhardt, M. ( IBM Microelectronics Div. (USA) ) Grauer, I.C. ( IBM Microelectronics Div. (USA) ) Wu, Q. ( IBM Microelectronics Div. (USA) ) Angyal, M. ( IBM Microelectronics Div. (USA) ) Hichri, H. ( IBM Microelectronics Div. (USA) ) Melville, I. ( IBM Microelectronics Div. (USA) ) Kumar, K. ( IBM Microelectronics Div. (USA) ) Lin, Y. ( IBM Microelectronics Div. (USA) ) Holmes, S.J. ( IBM Microelectronics Div. (USA) ) Varanasi, R. ( IBM Microelectronics Div. (USA) ) Spooner, T. ( IBM Microelectronics Div. (USA) ) McHerron, D. ( IBM Microelectronics Div. (USA) ) - Publication title:
- Optical Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5377
- Pub. Year:
- 2004
- Page(from):
- 980
- Page(to):
- 987
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- Language:
- English
- Call no.:
- P63600/5377.2
- Type:
- Conference Proceedings
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