1.

Conference Proceedings
Conference Proceedings
1. The impact of mask topography on binary reticles at the 65nm node
Word, J. ; Belledent, J. ; Trouiller, Y. ; Granik, Y. ; Toublan, O. ; Maurer, W.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.527-536,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Considerations for the use of defocus models for OPC
Sturtevant, J. L. ; Torres, J. A. ; Word, J. ; Granik, Y. ; LaCour, P.
Pub. info.: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.427-436,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5756
3.

Conference Proceedings
Conference Proceedings
3. Model-based OPC for sub-resolution assist feature enhanced layouts
LaCour, P. ; Pell, E.A. ; Granik, Y. ; Do, T.
Pub. info.: Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA.  pp.540-546,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4692
4.

Conference Proceedings
Conference Proceedings
4. Optimization of Technology and Design Parameters of IGBT Using TWB
Fatemizadeh, B. ; Granik, Y.
Pub. info.: Power semiconductor materials and devices : symposium held December 1-4, 1997, Boston, Massachusetts, U.S.A..  pp.357-,  1998.  Warrendale, Penn..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 483
5.

Conference Proceedings
Conference Proceedings
5. Failure prediction across process window for robust OPC
Shang, S.D. ; Granik, Y. ; Cobb, N.B. ; Maurer, W. ; Cui, Y. ; Liebmann, L.W. ; Oberschmidt, J.M. ; Singh, R.N. ; Vampatella, B.R.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.376-385,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
6.

Conference Proceedings
Conference Proceedings
6. Illuminator optimization methods in microlithography
Granik, Y.
Pub. info.: Novel optical systems design and optimization VII : 2-3 August 2004, Denver, Colorado, USA.  pp.217-229,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5524
7.

Conference Proceedings
Conference Proceedings
7. OPC methods to improve image slope and process window
Cobb, N.B. ; Granik, Y.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.116-125,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
8.

Conference Proceedings
Conference Proceedings
8. Chip-level line-width prediction methodology
LaCour, P. ; Sahouria, E.Y. ; Granik, Y.
Pub. info.: Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA.  pp.328-335,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4692
9.

Conference Proceedings
Conference Proceedings
9. Analytical approximations of the source intensity distributions [5992-177]
Granik, Y. ; Adam, K.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599255-599256,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
10.

Conference Proceedings
Conference Proceedings
10. On objectives and algorithms of inverse methods in microlithography [6349-184]
Granik, Y. ; Sakajiri, K. ; Shang, S.
Pub. info.: Photomask Technology 2006.  pp.63494R-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349