1.

Conference Proceedings
Conference Proceedings
1. The next phase for immersion lithography [6154-06]
Sewell, H. ; Mulkens, J. ; McCafferty, D. ; Markoya, L. ; Streefkerk, B. ; Graeupner, P.
Pub. info.: Optical Microlithography XIX.  pp.615406-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
2.

Conference Proceedings
Conference Proceedings
2. Optimizing and enhancing optical systems to meet the low k1 challenge
Flagello, D.G. ; Socha, R.J. ; Shi, X. ; Schoot, J.B. ; Baselmans, J. ; Kerkhof, M.A. ; Boeij, W. ; Engelen, A. ; Carpaij, R. ; Noordman, O. ; Moers, M.H.P. ; Mulder, M. ; Finders, J. ; Greevenbroek, H. ; Schriever, M. ; Maul, M. ; Haidner, H. ; Goeppert, M. ; Wegmann, U. ; Graeupner, P.
Pub. info.: Optical Microlithography XVI.  Part One  pp.139-150,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
3.

Conference Proceedings
Conference Proceedings
3. Impact of wavefront errors on low k1 processes at extremely high NA
Graeupner, P. ; Garreis, R.B. ; Goehnermeier, A. ; Heil, T. ; Lowisch, M. ; Flagello, D.G.
Pub. info.: Optical Microlithography XVI.  Part One  pp.119-130,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
4.

Conference Proceedings
Conference Proceedings
4. Solutions for printing sub-100-nm contacts with ArF
Graeupner, P. ; Goehnermeier, A. ; Lowisch, M. ; Garreis, R.B. ; Flagello,D.G. ; Hansen, S.G. ; Socha, R.J. ; Koehler, C.
Pub. info.: Optical Microlithography XV.  Part One  pp.503-514,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
5.

Conference Proceedings
Conference Proceedings
5. Performance of a high-NA dual-stage 193-nm TWINSCAN Step and Scan system for 80-nm applications
Klerk, J. ; Jorritsma, L. ; Setten, E. ; Droste, R. ; Jongh, R.C. ; Hansen, S.G. ; Smith, D. ; Kerkhof, M.A. ; Mast, F. ; Graeupner, P. ; Rohe, T. ; Kornitzer, K.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.822-840,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040