1.

Conference Proceedings
Conference Proceedings
1. Recent trends and progress in deep-UV lithography
Ronse,K. ; Goethals,A.M. ; Vandenberghe,G. ; Maenhoudt,M.
Pub. info.: Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.34-39,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3741
2.

Conference Proceedings
Conference Proceedings
2. Status of ArF lithography for the 130-nm technology node
Ronse,K. ; Vandenberghe,G. ; Jaenen,P. ; Delvaux,C. ; Vangoidsenhoven,D. ; Roey,F.Van ; Pollers,I. ; Maenhoudt,M. ; Goethals,A.M. ; Pollentier,I.K. ; Vleeming,B. ; Schenau,K.van lngen ; Heskamp,B. ; Davies,G. ; Niroomand,A.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.410-422,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. Top-surface imaging and optical proximity correction:a way to 0.18-ｦﾌm lithography at 248 nm
Goethals,A.M. ; Vertommen,J. ; Roey,F.Van ; Yen,A. ; Tritchkov,A. ; Ronse,K. ; Jonckheere,R. ; hove,L.Van den
Pub. info.: Optical Microlithography IX.  Part1  pp.362-374,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726