1.

Conference Proceedings
Conference Proceedings
1. ArF step-and-scan exposure system for 0.15-ｦﾌm and 0.13-ｦﾌm technology nodes
Mulkens,J. ; Stoeldraijer,J.M. ; Davies,G. ; Dierichs,M. ; Heskamp,B. ; Moers,M.H. ; George,R.A. ; Roempp,O. ; Glatzel,H. ; Wagner,C. ; Pollers,I. ; Jaenen,P.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.506-521,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. Next-generation 193-nm laser for sub-100-nm lithography
Duffey,T.P. ; Blumenstock,G.M. ; Fleurov,V.B. ; Pan,X.J. ; Newman,P.C. ; Glatzel,H. ; Watson,T.A. ; Erxmeyer,J. ; Kuschnereit,R. ; Weigl,B.
Pub. info.: Optical Microlithography XIV.  4346  pp.1202-1209,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346