Improvements in post-OPC data constraints for enhanced process corrections [6154-134]
- Author(s):
Burns, R. L. ( IBM SRDE (USA) ) Cui, Y. ( IBM SRDE (USA) ) Zhao, Z. ( IBM SRDE (USA) ) Stobert, I. ( IBM SRDE (USA) ) LaCour, P. ( Mentor Graphics Corp. (USA) ) Yehia, A. ( Mentor Graphics Corp. (USA) ) Madkour, K. ( Mentor Graphics Corp. (USA) ) Gheith , M. ( Mentor Graphics Corp. (USA) ) Seoud, A. ( Mentor Graphics Corp. (USA) ) - Publication title:
- Optical Microlithography XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6154
- Pub. Year:
- 2006
- Pt.:
- 3
- Page(from):
- 61543G
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- Language:
- English
- Call no.:
- P63600/6154
- Type:
- Conference Proceedings
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