Characterization of gate electrode etch process for 0.25 ヲフm extended to 0.18 ヲフm
- Author(s):
- Gerung,H. ( Chartered Semiconductor Manufacturing Ltd. )
- Chhagan,V.K.
- Yelehanka,P.R.
- Zhou,M.S.
- Hui,J.K.L.
- Publication title:
- Process and equipment control in microelectronic manufacturing : 19-20 May 1999, Edinburgh, Scotland
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3742
- Pub. Year:
- 1999
- Page(from):
- 96
- Page(to):
- 104
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819432223 [0819432229]
- Language:
- English
- Call no.:
- P63600/3742
- Type:
- Conference Proceedings
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