1.

Conference Proceedings
Conference Proceedings
1. ArF step-and-scan exposure system for 0.15-ｦﾌm and 0.13-ｦﾌm technology nodes
Mulkens,J. ; Stoeldraijer,J.M. ; Davies,G. ; Dierichs,M. ; Heskamp,B. ; Moers,M.H. ; George,R.A. ; Roempp,O. ; Glatzel,H. ; Wagner,C. ; Pollers,I. ; Jaenen,P.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.506-521,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. Challenges and opportunities for 157-nm mask technology
Mulkens,J. ; Wagner,C. ; Cummings,K.D. ; George,R.A.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.372-385,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
3.

Conference Proceedings
Conference Proceedings
3. Performance of a step-and-scan system for DUV lithography
Zwart,G.de ; Brink,M.A.van den ; George,R.A. ; Satriasaputra,D. ; Basselmans,J. ; Butler,H. ; Schoot,J.van ; Klerk,J.de
Pub. info.: Optical Microlithography X.  pp.817-835,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051