1.

Conference Proceedings
Conference Proceedings
1. Electron beam direct write process development for sub 45nm CMOS manufacturing
Zhang, P. ; Jaramillo, M. Jr. ; Rao, M. B. ; Ross, B. ; Horvath, B. ; Wong, P. ; Gehoel, W. ; Sinkwitz, S.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.408-416,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
2.

Conference Proceedings
Conference Proceedings
2. Progress toward developing high performance immersion compatible materials and processes
Claypool, J. B. ; Weimer, M. ; Krishnamurthy, V. ; Gehoel, W. ; Schenau, K. van Ingen
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.52-63,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)