1.

Conference Proceedings
Conference Proceedings
1. Strategy for manipulating the optical proximity effect by postexposure bake processing
Gau,T.-S. ; Wang,C.-M. ; Dai,C.-M.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.885-891,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
2.

Conference Proceedings
Conference Proceedings
2. Customized off-axis illumination aperture filtering for sub-0.18-ｦﾌm KrF Lithography
Hsia,C.-C. ; Gau,T.-S. ; Yang,C.-H. ; Liu,R.-C. ; Chang,C.-H. ; Chen,L.-J. ; Wang,C.-M. ; Chen,J.F. ; Smith,B.W. ; Hwang,G.-W. ; Lay,J.-W. ; Goang,D.-Y.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.427-434,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
3.

Conference Proceedings
Conference Proceedings
3. Customized illumination aperture filter for low k1 photolithography process
Gau,T.-S. ; Liu,R.-G. ; Chen,C.-K. ; Lai,C.-M. ; Liang,F.-J. ; Hsia,C.C.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.271-282,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
4.

Conference Proceedings
Conference Proceedings
4. Optimal positions for SB assignment and the specification of SB width variation
Lai,C.-M. ; Liu,R.-G. ; Gau,T.-S. ; Liang,F.-J. ; Chou,S.-Y. ; Shiu,L.-H.
Pub. info.: Optical Microlithography XIV.  4346  pp.1443-1450,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346