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12 results

Conference Proceedings

1. Liquid immersion lithography at 157 nm

Chen, C.-K. ; Gau, T.-S. ; Shiu, L.-H. ; Lin, B. J.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.435-446, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Conference Proceedings

2. Application of scatterometry for CD and profile metrology in 193-nm lithography process development

Chen, L.-J. ; Ke, C.-M. ; Yu, S.S. ; Gau, T.-S. ; Chen, P. ; Ku, Y.-C. ; Lin, B.J. ; Engelhard, D. ; Hetzer, D. ; Yang, J.Y. ; Barry, K.A. ; Yap, L. ; Yang, W.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVII. 1 pp.568-576, 2003. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5038

Conference Proceedings

3. Characterization of charging in CD-SEM for 90-nm metrology and beyond

Chen, L.-J. ; Lin, S.-W. ; Gau, T.-S. ; Lin, B.J.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVII. 1 pp.166-176, 2003. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5038

Conference Proceedings

4. Pattern-dependence optical phase effect on alternating phase shift mask

Chang, B.-C. ; You, J.-W. ; Lu, M. ; Lee, C.-L. ; Kung, L.-W. ; Shu, K.-C. ; Shin, J.-J. ; Gau, T.-S. ; Lin, B.J.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.745-755, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

5. Alt- PSM of contact with phase-assist feature for 65-nm node

You, J.-W. ; Shin, J.-J. ; Chang, C.-H. ; Kung, L.-W. ; Chang, B.-C. ; Dai, C.-M. ; Gau, T.-S. ; Lin, B.J.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.1263-1272, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

6. Effect of various ArF resist shrinkage amplitudes on CD bias

Ke, C.-M. ; Gau, T.-S. ; Chen, P.-H. ; Yen, A. ; Lin, B.J. ; Otaka, T. ; Iizumi, T. ; Sasada, K. ; Ueda, K.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVI. Part Two pp.997-1006, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4689

Conference Proceedings

7. 90-nm lithography process characterization using ODP scatterometry technology

Ke, C.-M. ; Yu, S.-S. ; Wang, Y.-H. ; Chou, Y.-J. ; Chen, J.-H. ; Lee, B.-H. ; Chu, H.-Y. ; Lin, H.-T. ; Gau, T.-S. ; Lin, C.-H. ; Ku, Y.-C. ; Lin, B.J. ; Huang, J. ; Hsu, J.J. ; Liu, V. ; Hetzer, D. ; Yap, L. ; Yang, W. ; Araki, K.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVIII. pp.597-604, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5375

Conference Proceedings

8. Quantification of CD-SEM wafer global charging effect on CD and CD uniformity of 193-nm lithography

Ke, C.-M. ; Hung, H.-L. ; Chang, A. ; Chen, J.-H. ; Gau, T.-S. ; Ku, Y.-C. ; Lin, B.J. ; Otaka, T. ; Ueda, K. ; Kawada, H. ; Nomura, H. ; Ren, N.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVIII. pp.173-182, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5375

Conference Proceedings

9. Study of line edge roughness using continuous wavelet transform for 65-nm node

Shiu, L.-H. ; Chen, C.-K. ; Gau, T.-S. ; Lin, B.-J.

Pub. info.:	Optical Microlithography XVII. pp.1983-1991, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377

10.

Conference Proceedings

10. General scaling law of optical lithography optical theory

Chen, C.-K. ; Gau, T.-S. ; Chen, L.-J. ; Lee, C.-C. ; Shin, J.-J. ; Yen, A. ; Lin, B.-J.

Pub. info.:	Optical Microlithography XVII. pp.1487-1498, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377

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Author: Gau, T.-S.