1.

Conference Proceedings
Conference Proceedings
1. Ring-test aberration determination and device lithography correlation
Garza,C.M. ; Conley,W. ; Roman,B.J. ; Schippers,M. ; Foster,J. ; Baselmans,J. ; Cummings,K.D. ; Flagello,D.G.
Pub. info.: Optical Microlithography XIV.  4346  pp.36-44,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
2.

Conference Proceedings
Conference Proceedings
2. The MEEF shall inherit the Earth
Conley,W. ; Garza,C.M. ; Dusa,M.V. ; Socha,R.J. ; Bendik,J.J. ; Mack,C.A.
Pub. info.: Optical Microlithography XIV.  4346  pp.251-258,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
3.

Conference Proceedings
Conference Proceedings
3. Improved method for the automated determination of E0 for lithography SPC
Mason,M.E. ; Soper,R.A. ; Garza,C.M.
Pub. info.: Optical Microlithography IX.  Part2  pp.847-858,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726