Bersuker, U. ; Zeitzoff, P. ; Brown, G. ; Kim, Y. ; Hoe, A. ; Lin, C. ; Young, C. ; Lysoght, P. ; Gardner, M. ; Murto, R. W ; Huff, H. R.
Pub. info.:
Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium. pp.417-422, 2003. Pennington, NJ. Electrochemical Society
Peterson, J. ; Barnett, J. ; Young, C. ; Hou, A. ; Gutt, J. ; Gopalan, S. ; Lee, C.H. ; Li, H.J. ; Moumen, N. ; Chaudhary, N. ; Lee, B.H. ; Bersuker, G. ; Zietzoff, P. ; Brown, G.A. ; Lysaght, P. ; Gardner, M. ; Murto, R.W. ; Huff, H.
Pub. info.:
Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium. pp.93-99, 2003. Pennington, NJ. Electrochemical Society
Gardner, M. ; Fulford, J. ; Bhat, M. ; Kwong, D.L.
Pub. info.:
Proceedings of the third Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films. pp.357-362, 1994. Pennington, NJ. Electrochemical Society
Gutt, J. ; Gopalan, S. ; Brown, G. A. ; Kirsch, P. D. ; Peterson, J. J. ; Gardner, M. ; Li, H.-J. ; Lysaght, P. ; Alshareef, H. N. ; Choi, K. ; Huffman, C. ; Wen, H. C. ; Majhi, P. ; Lee, B. H. ; Chatham, H. ; Park, S. ; Lanee, S. ; Bartholomew, L. ; Senzaki, Y. (Invited Paper)
Pub. info.:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.282-292, 2005. Pennington, NJ. Electrochemical Society
Proceedings of the third Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films. pp.180-184, 1994. Pennington, NJ. Electrochemical Society
Nieh, R. ; Qi, W-J. ; Jeon, Y. ; Lee, B. H. ; Lucas, A. ; Kang, L. ; Lee, J. C. ; Gardner, M. ; Gilmer, M.
Pub. info.:
Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.. pp.521-, 1999. Warrendale, PA. MRS - Materials Research Society
Chen, Y. Y. ; Gardner, M. ; Fulford, J. ; Wristers, D. ; Joshi, A. B. ; Kwong, D. L.
Pub. info.:
Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.. pp.283-, 1999. Warrendale, PA. MRS - Materials Research Society
Song, S. C. ; Lee, C. H. ; Luan, H. F. ; Kwong, D. L. ; Gardner, M. ; Fulford, J. ; Allen, M. ; Bloom, J. ; Evans, R.
Pub. info.:
Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.. pp.65-, 1999. Warrendale, PA. MRS - Materials Research Society
Song, S. C. ; Luan, H. F. ; Gardner, M. ; Fulford, J. ; Allen, M. ; Kwong, D. L.
Pub. info.:
Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.. pp.83-, 1999. Warrendale, PA. MRS - Materials Research Society