1.

Conference Proceedings
Conference Proceedings
1. Improved Shallow Trench Isolation Process for Sub-Quarter-Micron CMOS Technologies
Sallagoity, P. ; Gaillard, F. ; Rivoire, M. ; Paoli, M. ; Brouquet, P. ; Haond, M. ; McClathie, S. ; Beekmann, K. ; Kiermasz, A. ; Dobson, C.
Pub. info.: ULSI science and technology, 1997 : proceedings of the Sixth International Symposium on Ultralarge Scale Integration Science and Technology.  pp.453-466,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-3
2.

Conference Proceedings
Conference Proceedings
2. Copper-Barrier and Hard-Mask Elaboration by Plasma-Enhanced Chemical Vapor Deposition Using Organosilane Precursors
Remiat, B. ; Fusalba, F. ; Maury, P. ; Jousseaume, V. ; Lecornec, C. ; Gaillard, F. ; Durand, J.
Pub. info.: Copper interconnects, new contact metallurgies, structures, and low-k interlevel dielectrics : proceedings of the internatioal symposium.  pp.120-125,  2002.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-22
3.

Conference Proceedings
Conference Proceedings
3. INFRARED REFLECTION-ABSORPTION STUDY OF THE ANILINE ELECTROPOLYMERIZATION ON STAINLESS STEEL
Gaillard, F. ; Bouyssoux, G. ; Kumar, S. N.
Pub. info.: Advanced organic solid state materials : symposium held November 27-December 2, 1989, Boston, Massachusetts, U.S.A..  pp.359-362,  1990.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 173
4.

Conference Proceedings
Conference Proceedings
4. Copper-Barrier and Hard-Mask Elaboration by Plasma-Enhanced Chemical Vapor Deposition Using Organosilane Precursors
Remiat, B ; Fusalba, F. ; Maury, P. ; Jousseaume, V ; Lecornec, C. ; Gaillard, F. ; Durand, I.
Pub. info.: Thin film materials, processes, and reliability, plasma processing for the 100 nm node and copper interconnects with low-k inter-level dielectric films : proceedings of the international symposium.  pp.14-19,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-13
5.

Conference Proceedings
Conference Proceedings
5. Carbon Layer as a New Material for Optics
Clergereaux, R. ; Escaich, D. ; Martin, S. ; Raynaud, P. ; Gaillard, F.
Pub. info.: New materials for microphotonics : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.167-172,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 817