1.

Conference Proceedings
Conference Proceedings
1. Accurate and reliable optical CD of MuGFET down to 10nm
P. Leray ; G. F. Lorusso ; S. Cheng ; N. Collaert ; M. Jurczak ; S. Shirke
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
2.

Conference Proceedings
Conference Proceedings
2. Full field EUV lithography turning into a reality at IMEC
R. Jonckheere ; G. F. Lorusso ; A. M. Goethals ; J. Hermans ; B. Baudemprez ; A. Myers ; I. Kim ; A. Niroomand ; F. Iwamoto ; N. Stepanenko ; K. Ronse
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607
3.

Conference Proceedings
Conference Proceedings
3. Assessment of EUV reticle blank availability enabling the use of EUV tools today and in the future
R. Jonckheere ; G. F. Lorusso ; A. Goethals ; K. Ronse ; J. Hermans ; R. D. Ruyter
Pub. info.: EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6533
4.

Conference Proceedings
Conference Proceedings
4. EUV lithography program at IMEC
A. M. Goethals ; R. Jonckheere ; G. F. Lorusso ; J. Hermans ; F. V. Roey ; A. Myers ; M. Chandhok ; I. Kim ; A. Niroomand ; F. Iwamoto ; N. Stepanenko ; R. Gronheid ; B. Baudemprez ; K. Ronse
Pub. info.: Emerging lithographic technologies XI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6517
5.

Conference Proceedings
Conference Proceedings
5. Investigation of mask defectivity in full field EUV lithography
R. Jonckheere ; F. Iwamoto ; G. F. Lorusso ; A. M. Goethals ; K. Ronse
Pub. info.: Photomask technology 2007.  1  pp.673012-1-673012-12,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730
6.

Conference Proceedings
Conference Proceedings
6. Imaging performance of the EUV alpha demo tool at IMEC
G. F. Lorusso ; J. Hermans ; A. M. Goethals ; B. Baudemprez ; F. Van Roey
Pub. info.: Emerging lithographic technologies XII.  1  pp.69210O-1-69210O-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6921
7.

Conference Proceedings
Conference Proceedings
7. EUV pattern shift compensation strategies
T. Schmoeller ; I. Kim ; G. F. Lorusso ; A. Myers ; R. Jonckheere
Pub. info.: Emerging lithographic technologies XII.  1  pp.69211B-1-69211B-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6921