1.

Conference Proceedings
Conference Proceedings
1. Pitch doubling through dual-patterning lithography challenges in integration and litho budgets
M. Dusa ; J. Quaedackers ; O. F. A. Larsen ; J. Meessen ; E. van der Heijden ; G. Dicker ; O. Wismans ; P. de Haas ; K. van I. Schenau ; J. Finders ; B. Vleeming ; G. Storms ; P. Jaenen ; S. Cheng ; M. Maenhoudt
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
2.

Conference Proceedings
Conference Proceedings
2. Extending KrF lithography beyond 80nm with the TWINSCAN XT:1000H 0.93NA scanner
W. de Boeij ; G. Dicker ; M. de Wit ; F. Bornebroek ; M. Zellenrath
Pub. info.: Lithography Asia 2008.  1  pp.71401B-1-71401B-11,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7140
3.

Conference Proceedings
Conference Proceedings
3. Yield aware design of gate layer for 45 nm CMOS-ASIC using a high-NA dry KrF systems
E. Vreugdenhil ; H. Benten ; L. Reijnen ; G. Dicker ; J.-W. Gemmink
Pub. info.: Design for manufacturability through design-process integration II : 28-29 February 2008, San Jose, California, USA.  pp.69250D-1-69250D-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6925