1.

Conference Proceedings
Conference Proceedings
1. BEHAVIOR OF ULTRA FINE METALLIC PARTICLES (-10 inm) ON SILICON WAFER SURFACE
Morinaga, H. ; Futatsuki, T. ; Ohmi, T. ; Fuchita, E. ; Oda, M. ; Hayashi, C.
Pub. info.: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.458-465,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-7
2.

Conference Proceedings
Conference Proceedings
2. ULTRA THIN OXIDE FORMATION USING CHEMICAL OXIDE PASSIVATION
Nakamura, K. ; Futatsuki, T. ; Makihara, K. ; Ohmi, T.
Pub. info.: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.70-77,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-7
3.

Conference Proceedings
Conference Proceedings
3. THE EFFECT OF H2 ANNEALING ON THE Si SURFACE AND ITS USE IN THE STUDY OF ROUGHENING DURING WET CHEMICAL CLEANING
Verhaverbeke, S. ; Futatsuki, T. ; Messoussi, R. ; Ohmi, T.
Pub. info.: Proceedings of the Seventh International Symposium on Silicon Materials Science and Technology.  pp.1170-1181,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-10