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80 results

Conference Proceedings

1. SIMULATOR FOR DYNAMIC ION BEAM MIXING

Seidl, A. ; Fujii, K. ; Kiuchi, M. ; Satou, M. ; Takai, M.

Pub. info.:	Beam-solid interactions : fundamentals and applications : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A.. pp.29-34, 1993. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	279

Conference Proceedings

2. Influence of mask induced polarization effects on a pattern printability

Ishimaru, T. ; Matsuura, S. ; Seki, M. ; Fujii, K. ; Koizumi, R. ; Hakataya, Y. ; Moriya, A.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.576-586, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Conference Proceedings

3. Investigation of polarization effects on new mask materials

Itakura, Y. ; Kawasa, Y. ; Wakabayashi, O. ; Moriya, M. ; Nagai, S. ; Sumitani, A. ; Hagiwara, T. ; Ishimaru, T. ; Tsuji, S. ; Fujii, K. ; Wakamiya, W.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.587-598, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Conference Proceedings

4. Novel Wet Taper Etching of Interconnects on Large Area Substrates Using Galvanic Reaction

Kaneko, T. ; Hashimoto, Y. ; Ono, K. ; Fujii, K. ; Onisawa, K.

Pub. info.:	Thin Film Transistor Technologies V : proceedings of the International Symposium. pp.160-168, 2000. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2000-31

Conference Proceedings

5. Real-time color holography with high-resolution reflective LCD panels

Nakazaki, S. ; Sato, K. ; Morimoto, M. ; Fujii, K.

Pub. info.:	Practical Holography XVIII: Materials and Applications. pp.50-57, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5290

Conference Proceedings

6. 157-nm chromeless phase lithography with extremely high numerical aperture

Watanabe, K. ; Hagiwara, T. ; Matsuura, S. ; Suganaga, T. ; Itani, T. ; Fujii, K.

Pub. info.:	Optical Microlithography XVII. pp.537-544, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377

Conference Proceedings

7. Fluoropolymers for 157-nm single-layer resists developed using a new etching rate estimation model (KI-Model)

Kawaguchi, Y. ; Sasaki, T. ; Irisawa, J. ; Yokokoji, O. ; Irie, S. ; Otoguro, A. ; Itani, T. ; Fujii, K.

Pub. info.:	Advances in resist technology and processing XXI. pp.525-532, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376

Conference Proceedings

8. Novel testing scheme for selection of capacitive fingerprint sensor LSIs

Shimamura, T. ; Morimura, H. ; Unno, H. ; Fujii, K. ; Shigematsu, S. ; Machida, K. ; Kyuragi, H.

Pub. info.:	Design, characterization, and packaging for MEMS and microelectronics II : 17-19 December, 2001, Adelaide, Australia. pp.23-30, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4593

Conference Proceedings

9. 157-nm chromeless phase lithography for 45-nm SRAM gate

Suganaga, T. ; Watanabe, K. ; Matsuura, S. ; Hagiwara, T. ; Furukawa, T. ; Itani, T. ; Fujii, K.

Pub. info.:	Optical Microlithography XVII. pp.1616-1626, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377

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Conference Proceedings

10. Evaluation systems of F2 laser lithography materials

Itakura, Y. ; Kawasa, Y. ; Egawa, K. ; Sumitani, A. ; Sasaki, H. ; Higasikawa, I. ; Irie, S. ; Fujii, K. ; Itani, T. ; Nakano, H. ; Hata, H.

Pub. info.:	Optical Microlithography XVII. pp.1606-1615, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377

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