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13 results

Conference Proceedings

1. Developing a method to determine linewidth based on counting the atom spacings across a line

Silver,R.M. ; Jensen,C.P. ; Tsai,V.W. ; Fu,J. ; Villarrubia,J.S. ; Teague,E.C.

Pub. info.:	Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California. pp.441-460, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3332

Conference Proceedings

2. Measurement of pitch and width samples with the NIST calibrated atomic force microscope

Dixson,R. ; Koning,R. ; Vorburger,T.V. ; Fu,J. ; Tsai,V.W.

Pub. info.:	Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California. pp.420-432, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3332

Conference Proceedings

3. Accurate dimensional metrology with atomic force microscopy

Dixson,R.G. ; Koning,R. ; Fu,J. ; Vorburger,T.V. ; Renegar,B.T.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.362-368, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

Conference Proceedings

4. Step-height metrology for data storage applications

Kdning,R. ; Dixson,R.C. ; Fu,J. ; Renegar,B.T. ; Vorburger,T.V. ; Tsai,V.W. ; Postek,M.T.,Jr.

Pub. info.:	Recent advances in metrology, characterization, and standards for optical digital data disks : 21-22 July 1999, Denver, Colorado. pp.21-29, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3806

Conference Proceedings

5. Analysis of scattering from fractally rough surfaces by using the T-matrix method

Wang,X. ; Luo,X. ; Zhang,Z. ; Fu,J.

Pub. info.:	Microwave remote sensing of the atmosphere and environment : 15-17 September 1998, Beijing, China. pp.265-275, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3503

Conference Proceedings

6. Black photopolymer and fabrication of black matrix

Fu,J. ; Li,Y. ; Guo,J. ; Gao,H.

Pub. info.:	Display devices and systems II : 16-17 September 1998, Beijing, China. pp.64-69, 1998. Bellingham, Washington. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3560

Conference Proceedings

7. Identification and Mapping of Molecular Markers for Scab Resistance Genes in Apple

Hemmat,M. ; Cheng,F.S. ; Weeden,N.F. ; Brown,S.K. ; Aldwinckle,H.S. ; Fu,J.

Pub. info.:	Use of agriculturally important genes in biotechnology. pp.61-65, 2000. Amsterdam. IOS Press
Title of ser.:	NATO Science Series. Series A, Life Sciences
Ser. no.:	319

Conference Proceedings

8. Pigment-dispersed resists for color filters

Fu,J. ; Li,Y. ; Guo,J. ; Gao,H.

Pub. info.:	Display devices and systems II : 16-17 September 1998, Beijing, China. pp.116-121, 1998. Bellingham, Washington. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3560

Conference Proceedings

9. Experimental demonstration of a two-stage binary optical time delay system

Fu,J. ; Schamschula,M.P. ; Caulfield,H.J. ; Savant,G.D. ; Jannson,T. ; Campbell,G. ; Noginov,M.A. ; Sarkisov,S.S. ; Darwish,A.M. ; Venkateswarlu,P.

Pub. info.:	Materials, Devices, and Systems for Optoelectronic Processing. pp.187-193, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2848

10.

Conference Proceedings

10. Silicon single atom steps as AFM height standards

Dixson,R.G. ; Orji,N.G. ; Fu,J. ; Tsai,V. ; Williams,E.D. ; Kacker,R. ; Vorburger,T.V. ; Edwards,H.L. ; Cook,D. ; West,P.E. ; Nyffenegger,R.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XV. pp.157-168, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4344

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Author: Fu,J.