1.

Conference Proceedings
Conference Proceedings
1. Application of chromeless phase-shift masks to sub-100-nm SOI CMOS transistor fabrication
Fritze,M. ; Burns,J.M. ; Wyatt,P.W. ; Astolfi,D.K. ; Forte,T. ; Yost,D. ; Davis,P. ; Curtis,A.V. ; Preble,D.M. ; Cann,S.G. ; Denault,S. ; Liu,H.-Y. ; Shaw,J.C. ; Sullivan,N.T. ; Mastovich,M.E.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.388-407,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. Pattern asymmetries in phase-edge imaging
Fritze,M. ; Cann,S.G. ; Wyatt,P.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.567-581,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
3.

Conference Proceedings
Conference Proceedings
3. Application of attenuated phase-shift masks to sub-0.18-ｦﾌm logic patterns
Fritze,M. ; Wyatt,P.W. ; Astolfi,D.K. ; Davis,P. ; Curtis,A.V. ; Preble,D.M. ; Cann,S.G. ; Denault,S. ; Chan,D. ; Shaw,J.C. ; Sullivan,N.T. ; Brandom,R. ; Mastovich,M.E.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1179-1192,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
4.

Conference Proceedings
Conference Proceedings
4. Performance of excimer lasers as light sources for 193-nm lithography
Sedlacek,J.H.C. ; Doran,S.P. ; Fritze,M. ; Kunz,R.R. ; Rothschild,M. ; Uttaro,R.S. ; Corliss,D.A.
Pub. info.: Optical Microlithography X.  pp.874-881,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
5.

Conference Proceedings
Conference Proceedings
5. Minimization of mask transmission asymmetry effect for chromeless phase-shift masks
Chan,D. ; Novak,J.W. ; Fritze,M.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.911-920,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
6.

Conference Proceedings
Conference Proceedings
6. Investigation of full-field CD control of sub-100-nm gate features by phase-shift 248-nm lithography
Fritze,M. ; Tyrrell,B. ; Astolfi,D.K. ; Davis,P. ; Wheeler,B. ; Mallen,R. ; Jarmolowicz,J. ; Cann,S.G. ; Chan,D.Y. ; Rhyins,P.D. ; Mastovich,M.E. ; Sullivan,N.T. ; Brandom,R. ; Carney,C. ; Fritze,M. ; Blachowicz,B.A.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.334-343,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
7.

Conference Proceedings
Conference Proceedings
7. Characterization of quartz-etched PSM masks for KrF lithography at the 100-nm node
Rhyins,P. ; Fritze,M. ; Chan,D. ; Carney,C. ; Blachowicz,B.A. ; Vieira,M. ; Mack,C.A.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.486-495,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562