MECHANISM OF DRY ETCHING OF SILICON DIOXIDE: A CASE OF DIRECT REACTIVE ION ETCHING
- Author(s):
- Publication title:
- Plasma synthesis and etching of electronic materials : symposium held November 27-30, 1984, Boston, Massachusetts, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 38
- Pub. Year:
- 1985
- Page(from):
- 157
- Page(to):
- 162
- Pages:
- 6
- Pub. info.:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9780931837036 [0931837030]
- Language:
- English
- Call no.:
- M23500/38
- Type:
- Conference Proceedings
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