Blank Cover Image

MECHANISM OF DRY ETCHING OF SILICON DIOXIDE: A CASE OF DIRECT REACTIVE ION ETCHING

Author(s):
Publication title:
Plasma synthesis and etching of electronic materials : symposium held November 27-30, 1984, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
38
Pub. Year:
1985
Page(from):
157
Page(to):
162
Pages:
6
Pub. info.:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9780931837036 [0931837030]
Language:
English
Call no.:
M23500/38
Type:
Conference Proceedings

Similar Items:

Graham, Sandra W., Steinbruchel, Christoph

MRS - Materials Research Society

Arnot, H. E. G., Zappe, H. P., Epler, J. E., Graf, B., Widmer, R., Lehmann, H. W.

MRS - Materials Research Society

Graham, Sandra W., Steinbruchel, Christoph

Materials Research Society

Muri, J., Steinbruchel, Ch.

Materials Research Society

Howard, B.J., Wolterman, S.K., Yoo, W.J., Gittleman, B., Steinbruchel, Ch.

Materials Research Society

Brusic, V., Yang, C.H.

Electrochemical Society

4 Conference Proceedings Deep Reactive Ion Etching of Silicon

Ayon, A.A., Chen, K-S., Lohner, K.A., Spearing, S.M., Sawin, H.H., Schmidt, M.A.

Materials Research Society

10 Conference Proceedings APPLICATIONS OF PLASMA ETCHING

Lehmann W. H.

Kluwer Academic Publishers

Fortuno, Guadalupe

Materials Research Society

Park, H.-H., Kwon, K.-H., Lee, S.-H., Nahm, S., Lee, J.-W., Koak, B.-H., Suh, K.-S., Kwon, O.-J., Lee, J.-L., Yeom, …

MRS - Materials Research Society

Lehmann,V.

Kluwer Academic Publishers

Hwang, D.K., Ruzyllo, J., Kamieniecki, E.

Electrochemical Society

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12