1.

Conference Proceedings
Conference Proceedings
1. CLEAN-ROOM AND CO2-LASER PROCESSING OF ULTRA HIGH PURITY AL2O3
Morris, P.A. ; French, R.H. ; Coble, R.L. ; Tebbe,F.N. ; Chowdhry,U.
Pub. info.: Defect properties and processing of high-technology nonmetallic materials : symposium held December 2-4, 1985, Boston, Massachusetts, U.S.A..  pp.79-86,  1986.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 60
2.

Conference Proceedings
Conference Proceedings
2. 157-nm pellicles: polymer design for transparency and lifetime
French, R.H. ; Wheland, R.C. ; Qiu, W. ; Lemon, M.F. ; Blackman, G.S. ; Zhang, E. ; Gordon, J. ; Liberman, V. ; Grenville, A. ; Kunz, R.R. ; Rothschild, M.
Pub. info.: Optical Microlithography XV.  Part One  pp.576-583,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
3.

Conference Proceedings
Conference Proceedings
3. Behavior of candidate organic pellicle materials under 157-nm laser irradiation
Grenville, A. ; Liberman, V. ; Rothschild, M. ; Sedlacek, J.H.C. ; French, R.H. ; Wheland, R.C. ; Zhang, X. ; Gordan, J.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1644-1653,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
4.

Conference Proceedings
Conference Proceedings
4. Immersion fluid refractive indices using prism minimum deviation techniques
French, R.H. ; Yang, M.K. ; Lemon, M.F. ; Synowicki, R.A. ; Pribil, G.K. ; Cooney, G.T. ; Herzinger, C.M. ; Green, S.E. ; Burnett, J.H. ; Kaplan, S.G.
Pub. info.: Optical Microlithography XVII.  pp.1689-1694,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
5.

Conference Proceedings
Conference Proceedings
5. 157-nm pellicles for photolithography: mechanistic investigation of the deep-UV photolysis of fluorocarbons
Lee, K. ; Jockusch, S. ; Turro, N.J. ; French, R.H. ; Wheland, R.C. ; Lemon, M.F. ; Braun, A.M. ; Widerschpan, T. ; Zimmerman, P.
Pub. info.: Optical Microlithography XVII.  pp.1598-1605,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
6.

Conference Proceedings
Conference Proceedings
6. Single layer fluropolymer resists for 157-nm lithography
Crawford, M.K. ; Farnham, W.B. ; Feiring, A.E. ; Feldman, J. ; French, R.H. ; Leffew, K.W. ; Petrov, V.A. ; Qiu, W. ; Schadt, F.L. ; Tran, H.V. ; Wheland, R.C. ; Zumsteg, F.C. Jr.,
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.80-92,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039