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12 results

Conference Proceedings

1. Feasibility of printing 0.1-ｦﾌm technology with optical lithography

Maenhoudt,M. ; Verhaegen,S. ; Ronse,K. ; Flagello,D.G. ; Geh,B. ; Kaiser,W.M.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part1 pp.347-357, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

2. Impact of coma on CD control for multiphase PSM designs

Schmidt,R.T. ; Spence,C.A. ; Capodieci,L. ; Krivokapic,Z. ; Geh,B. ; Flagello,D.G.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.15-24, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

Conference Proceedings

3. Optical lithography into the millennium:sensitivity to aberrations,vibration,and polarization

Flagello,D.G. ; Mulkens,I. ; Wagner,C.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.172-183, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

4. Advanced technology for extending optical lithography

Wagner,C. ; Kaiser,W.M. ; Mulkens,I. ; Flagello,D.G.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.344-357, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

5. Forbidden pitches for 130-nm lithography and below

Socha,R.J. ; Dusa,M.V. ; Capodieci,L. ; Finders,J. ; Chen,J.F. ; Flagello,D.G. ; Cummings,K.D.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1140-1155, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

6. Understanding systematic and random CD variations using predictive modeling techniques

Flagello,D.G. ; Laan,H.van der ; Schoot,J.van ; Bouchoms,I. ; Geh,B.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part1 pp.162-175, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

7. Deducing aerial image behavior from AIMS data

Gordon,R.L. ; Flagello,D.G. ; McCallum,M.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.734-743, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

8. Lithographic lens testing:analysis of measured aerial images,interferometric data,and photoresist measurements

Flagello,D.G. ; Geh,B.

Pub. info.:	Optical Microlithography IX. Part2 pp.788-798, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2726

Conference Proceedings

9. Ring-test aberration determination and device lithography correlation

Garza,C.M. ; Conley,W. ; Roman,B.J. ; Schippers,M. ; Foster,J. ; Baselmans,J. ; Cummings,K.D. ; Flagello,D.G.

Pub. info.:	Optical Microlithography XIV. 4346 pp.36-44, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

10.

Conference Proceedings

10. Can DUV take us below 100 nm?

Finders,J. ; Jorritsma,L. ; Eurlings,M. ; Moerman,R. ; Greevenbroek,H.van ; Schoot,J.B.van ; Flagello,D.G. ; Socha,R.J. ; Stammler,T.

Pub. info.:	Optical Microlithography XIV. 4346 pp.153-165, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

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Author: Flagello,D.G.