New photomask substrate for improved lithography performance
- Author(s):
- Kasprowicz, B.S. ( Photronics Inc. (USA) )
- Priestley, R. ( Corning Inc. (USA) )
- Heslin, M.R.
- Fladd, D.R. ( Jacobian Technologies (USA) )
- Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 1331
- Page(to):
- 1339
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
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