1.

Conference Proceedings
Conference Proceedings
1. Application of image-processing software to characterize the photomask key parameters for future technologies
Tran,A. ; Schmidt,M.R. ; Farnsworth,J.N. ; Yan,P.-Y.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.423-432,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
2.

Conference Proceedings
Conference Proceedings
2. CF4/O2 plasma simulation and comparison with quartz etch experiment
Wu,H.-M. ; He,L. ; Farnsworth,J.N. ; Liu,G.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.409-417,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
3.

Conference Proceedings
Conference Proceedings
3. New approach to phase metrology for manufacturing 248-nm lithography-based embedded attenuated phase-shifting mask
Dao,G.T. ; Liu,G. ; Snyder,A. ; Farnsworth,J.N.
Pub. info.: Photomask and X-Ray Mask Technology III.  pp.359-370,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2793
4.

Conference Proceedings
Conference Proceedings
4. Technological challenges in implementation of alternating phase-shift mask
Tsai,W. ; Qian,Q. ; Buckmann,K.M. ; Cheng,W.-H. ; He,L. ; Irvine,B. ; Kamna,M. ; Korobko,Y. ; Kovalchick,M. ; Labovitz,S.M. ; Talevi,R. ; Farnsworth,J.N.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.433-443,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
5.

Conference Proceedings
Conference Proceedings
5. Tritone inspection for embedded phase-shift mask
Cheng,W.-H. ; Farnsworth,J.N. ; Tenjil,E.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.818-826,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
6.

Conference Proceedings
Conference Proceedings
6. Plasma etch of AZ5206/Cr and ZEP7000/Cr for 0.18- to 0.25-ｦﾌm-generation advanced mask fabrication
Tsai,W. ; Chen,F. ; Kamna,M. ; Chegwidden,S. ; Labovitz,S.M. ; Farnsworth,J.N. ; Dao,G.T.
Pub. info.: Photomask and X-Ray Mask Technology V.  pp.149-162,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3412
7.

Conference Proceedings
Conference Proceedings
7. Impact of the loading effect on CD control in plasma etching of Cr photomasks using ZEP 7000 resist
Chen,F. ; Tsai,W. ; Chegwidden,S. ; Yu,S. ; Kamna,M. ; Farnsworth,J.N. ; Coleman,T.P.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.429-437,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546