Implant Enhanced Diffusion of Boron in Silicon Germanium

Implant Enhanced Diffusion of Boron in Silicon Germanium

Author(s):

Publication title:

Strained layer epitaxy - materials processing and device applications : symposium held April 17-19, 1995, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

379

Pub. Year:

1995

Page(from):

379

Pub. info.:

Pittsburgh, PA: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558992825 [1558992820]

Language:

English

Call no.:

M23500/379

Type:

Conference Proceedings

Details

TDL ID:	ZA00017534
Series ID:	PA00000011
Conf. info. (Name):	Symposium on strained layer epitaxy-materials, processing, and device applications
Conf. info. (Number):	1995
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1995.04.17-1995.04.19

Similar Items:

1 Conference Proceedings A Comprehensive Model for Carbon Suppression of Boron Transient Enhanced Diffusion Ngau, Julie L., Griffin, Peter B., Plummer, James D. Materials Research Society	7 Conference Proceedings BORON-ENHANCED-DIFFUSION OF BORON FROM ULTRA- LOW-ENERGY BORON IMPLANTATION Agarwal, A., Eaglesham, D.J., Gossmann, H.-J., Pelaz, L., Herner, S.B., Jacobson, D.C., Haynes, T.E., Erokhin, Yu E. Electrochemical Society
2 Conference Proceedings The Influence of Amorphizing Implants on Boron Diffusion in Silicon Chao, H. S., Griffin, P. B., Plummer, J. D. MRS - Materials Research Society	8 Conference Proceedings Experimental Study of Self-Diffusion in Silicon Using Isotopically Enriched Structures Ural, A., Griffin, P. B., Plummer, J. D. MRS - Materials Research Society
3 Conference Proceedings EVIDENCE FOR A KICKOUT MECHANISM FOR GERMANIUM DIFFUSION IN SILICON Perozziello, E.A., Griffin, P.B., Plummer, J.D. Electrochemical Society	9 Conference Proceedings Nitridation Enhanced Diffusion of Antimony in Bulk and Silicon-on-Insulator Material Crowder, S.W., Griffin, P.B., Plummer, J.D. Electrochemical Society
4 Conference Proceedings The Local Structure Of Antimony In High Dose Antimony Implants In Silicon By XAFS And Sims Sahiner, M. Alper, Novak, Steven W., Woicik, Joe C., Takamura, Yayoi, Griffin, Peter B., Plummer, James D. Materials Research Society	10 Conference Proceedings Diffusion of Ion-Implanted Boron and Silicon in Germanium Uppal, Suresh, Willoughby, A.F.W., Bonar, J.M., Cowern, N.E.B., Morris, R.J.H., Dowsett, M.G. Materials Research Society
5 Conference Proceedings Physical Modeling of Transient Enhanced Diffusion in Silicon Griffin, P.B., Plummer, J.D. Electrochemical Society	11 Conference Proceedings A Comparative Study Of Dose Loss For B11 And BF2 Implants Kasnavi, Reza, Griffin, Peter B., Plummer, J. D. Materials Research Society
6 Conference Proceedings A Study of the Deactivation of High Concentration, Laser Annealed Dopant Profiles in Silicon Takamura, Yayoi, Jain, Sameer, Griffin, Peter B., Plummer, James D. Materials Research Society	12 Conference Proceedings Cross-Sectional TEM Sample Preparation Using E-Beam Lithography and Reactive Ion Etching Cho, Hyun-Jin, Griffin, Peter B., Plummer, James D. MRS - Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12