Optimization of multi-pole aperture for via patterning of 90 nm logic devices by KrF lithography
- Author(s):
Fang, S. P. ( United Microelectronics Corp. (Taiwan) ) Yang, H. ( United Microelectronics Corp. (Taiwan) ) Chang, H. ( United Microelectronics Corp. (Taiwan) ) Chiang, P. ( United Microelectronics Corp. (Taiwan) ) Lin, B. S.-M. ( United Microelectronics Corp. (Taiwan) ) Hung, K.-C. ( United Microelectronics Corp. (Taiwan) ) - Publication title:
- Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5754
- Pub. Year:
- 2005
- Pt.:
- 3
- Page(from):
- 1367
- Page(to):
- 1376
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457349 [0819457345]
- Language:
- English
- Call no.:
- P63600/5754
- Type:
- Conference Proceedings
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